Session and scheduling information are listed below. Select a session from the list and press "Go" to view the abstracts for that session.
|
Session
74
: Display Reflectance |
Display Measurement
|
Thursday, May 16 / 01:30 PM - 3:00 PM / San Jose Convention Center, LL21AB
Chair:
Stephen Atwood, Consultant, Webster, MA US
Co-Chair:
Thomas Fiske, Intuitive Surgical, Sunnyvale, CA US
74.1 - Display Reflectance Measurements Finally Made Simple, Comprehensive, and Affordable (1:30 PM - 1:50 PM)
-
Michael Becker
Display-Messtechnik & Systeme Rottenburg am Neckar Germany
-
Analysis of the point-spread function (PSF) yields the directional variations of scattered light with high resolution in the vicinity of the specular direction and at reduced but sufficient resolution — also at off-specular directions. This approach is applied to both identification and separation of mirror, haze, and Lambertian reflection components.
74.2 - From BRDF to Gloss: Comparing Specular Reflectance Measurements (1:50 PM - 2:10 PM)
-
Dirk Hertel
E Ink Corporation Billerica MA US
-
John Penczek
University of Colorado & NIST Boulder CO US
-
Jake Shin
Princeton University Princeton NJ US
-
The specular reflectance of a surface is an important factor that determines the gloss and glare observed from a display. This study compares several different methods for measuring specular reflectance and demonstrates their accuracy relative to a goniometric BRDF measurement.
74.3 - Regular Reflectance and Transmittance Measured by the Annulus Source Method (2:10 PM - 2:30 PM)
-
John Penczek
University of Colorado, Boulder & NIST Boulder CO US
-
The annulus source method can extract the true regular reflectance component from a reflective display in the presence of multiple scattering components. This study extends this work by demonstrating the capability of this method to measure the regular reflectance and transmittance of emissive, transparent, and augmented-reality displays.
74.4 - Research of FMLOC Visibility Phenomena Based on Huygens Point-Spread Function (2:30 PM - 2:50 PM)
-
Yamei Gao, Shiming Shi, Xiao Wang, Jiali Wang, Qian Li, Wei Tang, Jianbang Huang, Zhangmin Wu, Kezhi Liu, Yaqiu Li, Lin Li, Lin Zhang, Changbo Liu
BOE Technology Group Co., Ltd. Beijing China
-
The visibility phenomenon caused by the metal mesh of FMLOC under point-source illumination is analyzed. A simulation based on the point-spread function (PSF) of Huygens integral mode provides results with background filtration algorithm. When there is one graphic unit and no gap spacing between single-cycle graphic units, the phenomena are significantly improved.
74.5 Late-News Paper: Quality Assessment Toward Reflective Pattern Based on Diffraction Appearance (2:50 PM - 3:00 PM)
-
Soyoung Kwon, Wooyoung Cheon, Sumi Lee, Youngjun Seo, Jaejoong Kwon, Yongjo Kim
Samsung Display Yongin South Korea
-
While polarizer-free (Pol-less) OLED displays increase the efficiency of the panels by lowering the thickness, there comes an issue of the screen quality drop due to diffraction. The authors investigate the phenomena and invent a novel model for diffraction, since the color-difference-based evaluation alone has limitations in responding to customer needs in various environments and reflecting situations in which actual users embrace the screen quality. The main spatial features of the diffraction appearance are classified into the size and complexity of the pattern, and each factor is quantified through a specialized model. Diffraction features can be automatically calculated as numerical values from the invented model reflecting perceptual levels, which acts as a 'ruler' to achieve a good 'grade' of image quality in the product development stage. In this paper, the authors demonstrate what plays vital roles in diffraction appearance on Pol-less displays and how to evaluate the diffraction in representative values.